Patent · US Active

Spectral purity filter and lithographic apparatus

US8665420B2 · kind B2 · utility

1Cited by

3References

15Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Maarten Marinus Johannes Wilhelmus Van Herpen · Heesch, NL
Wouter Anthon Soer · Nijmegen, NL

Key dates

Filing date	Jul 29, 2009
Grant date	Mar 4, 2014
Priority date	—
Expiry date	Oct 16, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG21K1/062
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A spectral purity filter is configured to reflect extreme ultraviolet radiation. The spectral purity filter includes a substrate, and an anti-reflective coating on a top surface of the substrate. The anti-reflective coating is configured to transmit infrared radiation. The filter also includes a multi-layer stack configured to reflect extreme ultraviolet radiation and to substantially transmit infrared radiation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.