Charged particle beam writing apparatus and method
US8669537B2 · kind B2 · utility
2Cited by
10References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 16, 2009 |
| Grant date | Mar 11, 2014 |
| Priority date | — |
| Expiry date | Jul 8, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3174
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam writing apparatus and a charged particle beam writing method capable of shortening the time necessary to generate shot data and improving writing throughput. A graphic pattern defined in write data is divided into graphics represented in shot units. The divided graphics are temporarily stored in a memory and are distributed to their corresponding subfield areas while developing position information defined in a state of being compressed to write data. When each pattern is written by multi-pass writing, graphics divided at a first pass are used for distribution to subfield areas after a second pass.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.