System and method for generating extreme ultraviolet light, and laser apparatus
US8669543B2 · kind B2 · utility
13Cited by
2References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2011 |
| Grant date | Mar 11, 2014 |
| Priority date | — |
| Expiry date | Aug 19, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S2301/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.