Methods and devices for fabricating tri-layer beams
US8673671B2 · kind B2 · utility
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5References
19Claims
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Key dates
| Filing date | Nov 19, 2012 |
| Grant date | Mar 18, 2014 |
| Priority date | — |
| Expiry date | Nov 19, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0771
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods and devices for fabricating tri-layer beams are provided. In particular, disclosed are methods and structures that can be used for fabricating multilayer structures through the deposition and patterning of at least an insulation layer, a first metal layer, a beam oxide layer, a second metal layer, and an insulation balance layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.