Detecting and preventing instabilities in plasma processes
US8674606B2 · kind B2 · utility
72Cited by
26References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2010 |
| Grant date | Mar 18, 2014 |
| Priority date | — |
| Expiry date | Jan 27, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3299
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Systems, methods and apparatus for reducing instabilities in a plasma-based processing system are disclosed. An exemplary method includes applying power to a plasma with a power amplifier; determining whether low frequency instability oscillations are present or high frequency instability oscillations are present in the plasma; and altering, based upon whether high or low frequency instability oscillations are present, an impedance of a load that is experienced by the power amplifier, the load experienced by the power amplifier including at least an impedance of the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.