Microlithographic projection exposure apparatus
US8675178B2 · kind B2 · utility
0Cited by
14References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 25, 2008 |
| Grant date | Mar 18, 2014 |
| Priority date | — |
| Expiry date | Oct 3, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/701
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A microlithographic projection exposure apparatus and method are provided. In some embodiments, a microlithographic projection exposure apparatus includes a light source to generate pulsed light, an illumination device, a projection objective, and at least one photoelastic modulator between the pulsed light source and the illumination device. The illumination device is configured to illuminate an object plane of the projection objective. The projection object projects an image of an object in the object plane of the projection objective to the image plane of the projection objective.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.