Patent · US Active

Diffraction elements for alignment targets

US8681313B2 · kind B2 · utility

1Cited by
1References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 3, 2009
Grant dateMar 25, 2014
Priority date
Expiry dateMar 3, 2030

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F9/7076
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered reflector stack is provided. The diffractive elements are configured to enhance a pre-determined diffraction order used for pre-alignment and to diffract light in a pre-determined direction of a pre-alignment system when illuminated with light of a wavelength used for the pre-alignment. The diffractive elements may occupy at least half of an area of each alignment feature. The diffractive elements may be configured to enhance first or higher order diffractions, while substantially reducing zeroth diffraction orders and specular reflection when illuminated with a wavelength used for reticle prealignment. The dimensions of each diffractive element may be a function of a diffraction grating period of each alignment feature.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.