Enhancing accuracy of fast high-resolution X-ray diffractometry
US8687766B2 · kind B2 · utility
19Cited by
88References
18Claims
0Family size
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Key dates
| Filing date | Jul 12, 2011 |
| Grant date | Apr 1, 2014 |
| Priority date | — |
| Expiry date | Jan 22, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01T1/17
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for analysis includes directing a converging beam of X-rays toward a surface of a sample and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum of the sample. The diffraction spectrum is corrected to compensate for a non-uniform property of the converging beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.