Micromechanical component having a rear volume
US8692339B2 · kind B2 · utility
1Cited by
16References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 3, 2009 |
| Grant date | Apr 8, 2014 |
| Priority date | — |
| Expiry date | Sep 30, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2203/0392
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
In a method for manufacturing a micromechanical component, a cavity is produced in the substrate from an opening at the rear of a monocrystalline semiconductor substrate. The etching process used for this purpose and the monocrystalline semiconductor substrate used are controlled in such a way that a largely rectangular cavity is formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.