Patent · US Active

Micromechanical component having a rear volume

US8692339B2 · kind B2 · utility

1Cited by
16References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 3, 2009
Grant dateApr 8, 2014
Priority date
Expiry dateSep 30, 2029

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81B2203/0392
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

In a method for manufacturing a micromechanical component, a cavity is produced in the substrate from an opening at the rear of a monocrystalline semiconductor substrate. The etching process used for this purpose and the monocrystalline semiconductor substrate used are controlled in such a way that a largely rectangular cavity is formed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.