Patent · US Active

Method and apparatus for the position determination of structures on a mask for microlithography

US8694929B2 · kind B2 · utility

3Cited by

1References

16Claims

0Family size

Assignees

Carl Zeiss SMT GmbH · DE
Carl Zeiss SMS Ltd. · IL

Inventors

Dirk Seidel · Jena, DE
Michael Arnz · Oberkochen, DE

Key dates

Filing date	Jul 6, 2012
Grant date	Apr 8, 2014
Priority date	—
Expiry date	Jul 6, 2032

Classification

Technology area (CPC G)Physics
CPC primaryG21K5/00
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method and an apparatus for determining the position of a structure on a mask for microlithography, in which the position is determined by comparing an aerial image, measured by a recording device, of a portion of the mask with an aerial image determined by simulation. The position determination includes carrying out a plurality of such comparisons which differ from one another with regard to the input parameters of the simulation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.