Debris removal in high aspect structures
US8696818B2 · kind B2 · utility
18Cited by
15References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 15, 2012 |
| Grant date | Apr 15, 2014 |
| Priority date | — |
| Expiry date | Oct 15, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.