Patent · US Active

Implant free quantum well transistor, method for making such an implant free quantum well transistor and use of such an implant free quantum well transistor

US8698129B2 · kind B2 · utility

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Key dates

Filing dateDec 20, 2012
Grant dateApr 15, 2014
Priority date
Expiry dateDec 20, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D62/60

Abstract

An implant free quantum well transistor wherein the doped region comprises an implant region having an increased concentration of dopants with respect to the concentration of dopants of adjacent regions of the substrate, the implant region being substantially positioned at a side of the quantum well region opposing the gate region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.