Implant free quantum well transistor, method for making such an implant free quantum well transistor and use of such an implant free quantum well transistor
US8698129B2 · kind B2 · utility
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Key dates
| Filing date | Dec 20, 2012 |
| Grant date | Apr 15, 2014 |
| Priority date | — |
| Expiry date | Dec 20, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/60
Abstract
An implant free quantum well transistor wherein the doped region comprises an implant region having an increased concentration of dopants with respect to the concentration of dopants of adjacent regions of the substrate, the implant region being substantially positioned at a side of the quantum well region opposing the gate region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.