Automated repair method and system for double patterning conflicts
US8701056B1 · kind B1 · utility
6Cited by
5References
37Claims
0Family size
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Key dates
| Filing date | Sep 26, 2012 |
| Grant date | Apr 15, 2014 |
| Priority date | — |
| Expiry date | Sep 26, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of performing double patterning (DPT) conflict repairs is described. In this method, even cycles adjacent to odd cycles in a layout can be identified (also called adjacent even/odd cycles herein). The identifying can include forming graph constructs of the layout. Route guidances for break-link operations and split-node operations can be prioritized for the adjacent even/odd cycles. A list including the route guidances for the break-link operations and the split-node operations can be generated. The list can be ordered based on the prioritizing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.