Illuminating waveguide fabrication method
US8710463B1 · kind B1 · utility
Inventors
Key dates
| Filing date | Jul 9, 2013 |
| Grant date | Apr 29, 2014 |
| Priority date | — |
| Expiry date | Jul 9, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for fabricating waveguides comprising nano-apertures for illumination of sub-resolution exposures is presented. In particular, the end of a waveguide, such as an optical fiber, is coated with a material, such as an electrically conducting metal or a semiconductor. This material is then selectively removed through a lithography process using photon exposure to create an aperture in the material at the end of the waveguide. Under normal conditions, if the aperture is smaller than the wavelength of light in the waveguide, there is little or no transmission through the aperture. However, with the appropriate selection of materials and aperture geometry, for example a metallic conducting coating and sub-wavelength “C-shaped” or “bow-tie” aperture, enhancement of the transmission of light through the aperture can be achieved, allowing effective illumination of sub-resolution spots using the nano-aperture. This can be used in a nanolithography system incorporating waveguide illuminators as well.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.