Ion beam processing system and sample processing method
US8716683B2 · kind B2 · utility
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3References
5Claims
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Key dates
| Filing date | Nov 19, 2012 |
| Grant date | May 6, 2014 |
| Priority date | — |
| Expiry date | Nov 19, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N1/32
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An ion beam processing system (100) processes the sample (S) mounted on a sample stage (30) by irradiating the sample with an ion beam in a sample chamber (2). The system has a sample container (20) including a cover portion (26) formed to be detachably mountable to a base portion (24), the sample stage (30) on which the container (20) is detachably mountable, and cover mounting/dismounting apparatus (40) for mounting and dismounting the cover portion (26) from outside the sample chamber (2).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.