SLM calibration
US8717535B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 22, 2008 |
| Grant date | May 6, 2014 |
| Priority date | — |
| Expiry date | Feb 10, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70516
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.