Electrostatic remote plasma source
US8723423B2 · kind B2 · utility
52Cited by
21References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 23, 2012 |
| Grant date | May 13, 2014 |
| Priority date | — |
| Expiry date | Mar 10, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/466
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.