High-aperture immersion objective
US8724227B2 · kind B2 · utility
3Cited by
10References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 25, 2011 |
| Grant date | May 13, 2014 |
| Priority date | — |
| Expiry date | Apr 4, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/02
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A high-aperture immersion objective, in particular for confocal applications in fluorescence microscopy and for TIRF applications, having three subsystems of lenses and/or lens groups. The design of the subsystems has made it possible for a relatively large object field of 0.25 mm to be present in the case of a high-resolution numerical aperture of 1.49. Furthermore, improved transparency is possible up to a wavelength of 340 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.