Methods for introducing a first gas and a second gas into a reaction chamber

US8728574B2 · kind B2 · utility

Assignee

• MEMC Electronic Materials, Inc. · US

Inventors

• Milind Kulkarni · Chesterfield, US
• Puneet Gupta · Singapore, SG
• Balaji Devulapalli · Chesterfield, US
• Jameel Ibrahim · Baton Rouge, US
• Vithal Revankar · Seabrook, US
• Kwasi Foli · Columbia, US

Key dates

• Filing date: Apr 25, 2012
• Grant date: May 20, 2014
• Expiry date: Apr 25, 2032

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B01J2219/00252
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

Gas distribution units of fluidized bed reactors are configured to direct thermally decomposable compounds to the center portion of the reactor and away from the reactor wall to prevent deposition of material on the reactor wall and process for producing polycrystalline silicon product in a reactor that reduce the amount of silicon which deposits on the reactor wall.