Ion beam sample preparation apparatus and methods
US8729510B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 21, 2013 |
| Grant date | May 20, 2014 |
| Priority date | — |
| Expiry date | Apr 21, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3118
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. A retention stage lifting means allows the creation of a loading chamber that is isolated from the main vacuum chamber where sample ion beam milling takes place. A heat sink means is configured to conduct heat away from the sample undergoing sample preparation in the ion beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.