Patent · US Active

RF-driven ion source with a back-streaming electron dump

US8729806B2 · kind B2 · utility

3Cited by

4References

14Claims

0Family size

Assignee

The Regents of the University of California · US

Inventors

Joe Kwan · Castro Valley, US
Qing Ji · Albany, US

Key dates

Filing date	Jan 27, 2011
Grant date	May 20, 2014
Priority date	—
Expiry date	Nov 1, 2032

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/31701
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A novel ion source is described having an improved lifetime. The ion source, in one embodiment, is a proton source, including an external RF antenna mounted to an RF window. To prevent backstreaming electrons formed in the beam column from striking the RF window, a back streaming electron dump is provided, which in one embodiment is formed of a cylindrical tube, open at one end to the ion source chamber and capped at its other end by a metal plug. The plug, maintained at the same electrical potential as the source, captures these backstreaming electrons, and thus prevents localized heating of the window, which due to said heating, might otherwise cause window damage.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.