Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method
US8735048B2 · kind B2 · utility
3Cited by
2References
15Claims
0Family size
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Key dates
| Filing date | Jan 27, 2011 |
| Grant date | May 27, 2014 |
| Priority date | — |
| Expiry date | Jan 27, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.