Methods and devices for forming nanostructure monolayers and devices including such monolayers

US8735226B2 · kind B2 · utility

Assignee

• Sandisk, Inc. · US

Inventors

• Jian Chen · San Jose, US
• Karen Chu Cruden · Pleasanton, US
• Xiangfeng Duan · Los Angeles, US
• Chao Liu · San Jose, US
• J. Wallace Parce · Palo Alto, US

Key dates

• Filing date: Aug 1, 2013
• Grant date: May 27, 2014
• Expiry date: Aug 1, 2033

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S977/891
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, formation of arrays in spin-on-dielectrics, solvent annealing after nanostructure deposition, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices).