Cross-hair cell wordline formation
US8741758B2 · kind B2 · utility
18Cited by
9References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 18, 2013 |
| Grant date | Jun 3, 2014 |
| Priority date | — |
| Expiry date | Jan 18, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B12/36
Abstract
Methods and devices depicting fabrication of non-planar access devices having fins and narrow trenches, among which is a method that includes wet etching a conductor to form a recessed region and subsequently etching the conductor to form gates on the fins. The wet etching may include formation of recesses which are may be backfilled with a fill material to form spacers on the conductor. Portions of a plug may be removed during the wet etch to form overhanging spacers to provide further protection of the conductor during the dry etch.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.