Patent · US Active

Process for manufacturing an improved analog transistor

US8748270B1 · kind B1 · utility

20Cited by
403References
19Claims
0Family size

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Key dates

Filing dateJul 20, 2012
Grant dateJun 10, 2014
Priority date
Expiry dateJul 20, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/038

Abstract

An analog transistor useful for low noise applications or for electrical circuits benefiting from tight control of threshold voltages and electrical characteristics is described. The analog transistor includes a substantially undoped channel positioned under a gate dielectric between a source and a drain with the undoped channel not being subjected to contaminating threshold voltage implants or halo implants. The channel is supported on a screen layer doped to have an average dopant density at least five times as great as the average dopant density of the substantially undoped channel which, in turn, is supported by a doped well having an average dopant density at least twice the average dopant density of the substantially undoped channel.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.