Combined motion control system
US8751050B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 29, 2007 |
| Grant date | Jun 10, 2014 |
| Priority date | — |
| Expiry date | Oct 1, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70525
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An examination and processing machine, in particular a lithography appliance, for use in the semiconductor industry, comprising a machine frame (1), an examination or processing device (5) for a work piece (4), a carriage (3) which is mounted on the machine frame (1) and can hold the work piece (4), a handling device (6) for positioning the work piece (4) on the carriage (3) and for removing it from the carriage (3), a series of oscillation isolators (2) for low-oscillation mounting of the machine frame (1), and individual control devices (30, 40, 20) for controlling the carriage (3), the handling device (6) and the oscillation isolators (2). These control devices (20, 30, 40) are subordinate to an overall control device (50), which acts as a host system, via a real-time bus (60).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.