Thin film device with minimized spatial variation of local mean height
US8765252B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2007 |
| Grant date | Jul 1, 2014 |
| Priority date | — |
| Expiry date | Jun 24, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24942
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
This invention provides a thin film device with minimized spatial variation of local mean height. More specifically, the thin film device has a substrate and at least one first structure having a first spatially varying weighted local mean height determined by a layer weighting function. The first structure has a first maximum height, a first minimum height and a first variation for a given averaging area. A compensation structure is also provided upon the substrate, the compensation structure having a second spatially varying weighted local mean height determined by the layer weighting function. The compensation structure also has a second maximum height, a second minimum height and a second variation for the given averaging area. The first structure and compensation structure combine to provide a combined structure upon the substrate with minimized spatial variation of a combined weighted local mean.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.