Resist composition and method for producing semiconductor device
US8765353B2 · kind B2 · utility
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5Claims
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Key dates
| Filing date | Sep 21, 2011 |
| Grant date | Jul 1, 2014 |
| Priority date | — |
| Expiry date | Jan 10, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0273
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.