Patent · US Active

Microlithographic projection exposure apparatus

US8767176B2 · kind B2 · utility

4Cited by

0References

30Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Sascha Bleidistel · Aalen, DE
Yim-Bun Patrick Kwan · Aalen, DE
Florian Bach · Oberkochen, DE
Daniel Benz · Winnenden, DE
Severin Waldis · Aalen, DE
Armin Werber · Gottenheim, DE

Key dates

Filing date	Mar 21, 2011
Grant date	Jul 1, 2014
Priority date	—
Expiry date	Apr 24, 2032

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.