Plasma monitoring device using a cylindrical hollow electrode
US8767203B2 · kind B2 · utility
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5References
7Claims
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Key dates
| Filing date | Aug 25, 2011 |
| Grant date | Jul 1, 2014 |
| Priority date | — |
| Expiry date | Sep 25, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/2431
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma generating unit for a process monitoring device includes a hollow first electrode extending in a length direction and a second electrode extending in the length direction and positioned within and displaced from the first electrode with a distance therebetween. The first electrode has an inner diameter and the second electrode has an outer diameter selected to vary the distance between the electrodes in the length direction so that the plasma generating unit generates a plasma by ionizing a gas flowing between the electrodes at a different position in the length direction based on a pressure of the gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.