Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns
US8771917B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Dec 31, 2011 |
| Grant date | Jul 8, 2014 |
| Priority date | — |
| Expiry date | Feb 1, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.