Acid-etch resistant, protective coatings
US8771927B2 · kind B2 · utility
2Cited by
42References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2010 |
| Grant date | Jul 8, 2014 |
| Priority date | — |
| Expiry date | Jan 16, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31909
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.