Reduced plasmon shield-generator gap structure and process
US8773803B2 · kind B2 · utility
6Cited by
6References
19Claims
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Key dates
| Filing date | Oct 18, 2012 |
| Grant date | Jul 8, 2014 |
| Priority date | — |
| Expiry date | Oct 18, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2005/0021
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Three structures, and processes for manufacturing them, that improve the performance of a TAMR feature in a magnetic write head are disclosed. This improvement is achieved by making the separation between the edge plasmon generator and the plasmon shield less than the separation between the edge plasmon generator and the optical wave-guide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.