Mask, method of manufacturing mask and apparatus for manufacturing mask
US8778115B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2010 |
| Grant date | Jul 15, 2014 |
| Priority date | — |
| Expiry date | Jan 7, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of efficiently manufacturing a large-sized mask is disclosed. In one embodiment, the method includes: 1) providing a first mask member comprising i) a first pattern unit having a plurality of slits, ii) a first buffer unit spaced apart from the first pattern unit, and iii) a first bonding unit interconnecting the first pattern unit and the first buffer unit and 2) providing a second mask member comprising i) a second pattern unit having a plurality of slits, ii) a second buffer unit spaced apart from the second pattern unit, and iii) a second bonding unit interconnecting the second pattern unit and the second buffer unit. The method may further include contacting the first bonding unit and the second bonding unit; and connecting the first mask member to the second mask member while tensile forces are applied to the first mask member and the second mask member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.