Aperture unit for a particle beam device
US8779381B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2011 |
| Grant date | Jul 15, 2014 |
| Priority date | — |
| Expiry date | Mar 1, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/022
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An aperture unit for a particle beam device, in particular an electron beam device, is disclosed. Deposit supporting units are arranged at the aperture unit, with which deposit supporting units contaminations can be bound in such a way that the contaminations can no longer deposit at an aperture opening of the aperture unit. Coatings which can be arranged on the aperture unit make it possible to reduce interactions which cause contaminations to deposit at the aperture opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.