Patent · US Active

Aperture unit for a particle beam device

US8779381B2 · kind B2 · utility

0Cited by
4References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 19, 2011
Grant dateJul 15, 2014
Priority date
Expiry dateMar 1, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/022
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

An aperture unit for a particle beam device, in particular an electron beam device, is disclosed. Deposit supporting units are arranged at the aperture unit, with which deposit supporting units contaminations can be bound in such a way that the contaminations can no longer deposit at an aperture opening of the aperture unit. Coatings which can be arranged on the aperture unit make it possible to reduce interactions which cause contaminations to deposit at the aperture opening.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.