Computational lithography with feature upsizing
US8793626B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 22, 2013 |
| Grant date | Jul 29, 2014 |
| Priority date | — |
| Expiry date | Mar 22, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of computational lithography includes providing through-focus critical dimension (CD) curves at a range of different focus values (Bossung curves) for a plurality of feature types that include different ratios of line width to space width. Using software run on a computing device, it is determined if there is at least one marginal feature type from the plurality of feature types based an image tool capability and a predetermined process specification affected by at least one of the plurality of feature types. Provided a marginal feature type is determined to be present, at least the marginal feature type(s) is upsized. A degree of upsizing increases as a curvature of the Bossung curves increases. A computational lithography model is compiled including the upsizing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.