Hardmask
US8795774B2 · kind B2 · utility
3Cited by
7References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 23, 2012 |
| Grant date | Aug 5, 2014 |
| Priority date | — |
| Expiry date | Jan 29, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/1808
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Compositions containing certain organometallic oligomers suitable for use as spin-on, metal hardmasks are provided, where such compositions can be tailored to provide a metal oxide hardmask having a range of etch selectivity. Also provided are methods of depositing metal oxide hardmasks using the present compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.