Wave-shaped mask of fabricating nano-scaled structure
US8795928B2 · kind B2 · utility
0Cited by
1References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 16, 2012 |
| Grant date | Aug 5, 2014 |
| Priority date | — |
| Expiry date | May 23, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.