Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition
US8795944B2 · kind B2 · utility
2Cited by
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28Claims
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Key dates
| Filing date | Dec 11, 2009 |
| Grant date | Aug 5, 2014 |
| Priority date | — |
| Expiry date | Mar 17, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.