Charged particle beam drawing method and apparatus
US8796650B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 17, 2010 |
| Grant date | Aug 5, 2014 |
| Priority date | — |
| Expiry date | Oct 29, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/20
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam drawing apparatus includes a charged particle beam gun, a first forming aperture member having an opening, wherein a charged particle beam emitted from the charged particle beam gun is passed through the opening of the first forming aperture member, a second forming aperture member having an opening, wherein the charged particle beam passed through the first forming aperture member is passed through the opening of the second forming aperture member, a movable stage for supporting a workpiece, wherein patterns corresponding to figures in a drawing data are drawn on the workpiece by the charged particle beam passed through the second forming aperture member, and a drawing data correcting process portion for moving the figures in the drawing data on the basis of positions in the opening of the second forming aperture, where the charged particle beam for drawing the patterns is passed through.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.