Plasma cell and method of manufacturing a plasma cell
US8796927B2 · kind B2 · utility
4Cited by
4References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 3, 2012 |
| Grant date | Aug 5, 2014 |
| Priority date | — |
| Expiry date | Oct 7, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2211/326
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma cell and a method for making a plasma cell are disclosed. In accordance with an embodiment of the present invention, a cell comprises a semiconductor material, an opening disposed in the semiconductor material, a dielectric layer lining a surface of the opening, a cap layer closing the opening, a first electrode disposed adjacent the opening, and a second electrode disposed adjacent the opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.