Material gas concentration control system
US8800589B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 30, 2009 |
| Grant date | Aug 12, 2014 |
| Priority date | — |
| Expiry date | Sep 18, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/2509
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An object of this invention is to provide a responsive material gas concentration control system that can be mounted on a bubbling system and that can control a concentration of a material gas in a mixed gas at a constant value even though a partial pressure of the material gas fluctuates. The material gas concentration control system is used for a material evaporation system, and comprises a body that is connected to an outlet line and that has an internal flow channel for flowing the mixed gas, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a first valve that is arranged downstream of the concentration measuring part and that adjusts the measured concentration measured by the concentration measuring part at a previously determined set concentration, wherein the concentration measuring part and the first valve are mounted on the body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.