RF/VHF impedance matching, 4 quadrant, dual directional coupler with V RMS/IRMS responding detector circuitry
US8803424B2 · kind B2 · utility
29Cited by
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20Claims
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Key dates
| Filing date | Oct 20, 2010 |
| Grant date | Aug 12, 2014 |
| Priority date | — |
| Expiry date | Jun 12, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H7/40
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A detector circuit may be configured to sense the AC process signal and output a DC magnitude error signal and a DC phase error signal. A controller may be coupled to the detector circuit and the RF matching network and configured to receive the DC magnitude and phase error signals and to vary an impedance of the RF matching network in response to the DC magnitude and phase error signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.