Method for fabricating patterned dichroic film
US8815102B2 · kind B2 · utility
2Cited by
66References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 23, 2012 |
| Grant date | Aug 26, 2014 |
| Priority date | — |
| Expiry date | Aug 4, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/285
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for fabricating a patterned dichroic film is provided, wherein the method comprises steps as follows: A patterned material layer comprising at least one inorganic layer is firstly provided on a substrate. A film deposition process is then performed to form a dichroic film on the patterned material layer and the substrate. The patterned material layer is subsequently removed, whereby a portion of the dichroic film disposed on the patterned material layer can be removed simultaneously.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.