Method of supplying etching gas and etching apparatus
US8815106B2 · kind B2 · utility
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3References
8Claims
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Assignee
Inventors
Key dates
| Filing date | Aug 10, 2011 |
| Grant date | Aug 26, 2014 |
| Priority date | — |
| Expiry date | Apr 2, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3341
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of supplying an etching gas includes: supplying a first etching gas used in an etching process into a processing container; and supplying a second etching gas used in the etching process into the processing container, in which, when the first etching gas and the second etching gas are switched therebetween, only a small amount of a gas, which is needed as an etching gas before the switching and is not needed as an etching gas after the switching, is continuously supplied into the processing container.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.