Rendered database image-to-inspection image optimization for inspection
US8818072B2 · kind B2 · utility
3Cited by
1References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 25, 2010 |
| Grant date | Aug 26, 2014 |
| Priority date | — |
| Expiry date | Feb 26, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The present disclosure provides a method of inspecting a photolithographic mask wherein a design database is received, and a feature of the design database is adjusted by a bias factor to produce a biased database. Image rendering is performed on the biased database to produce a biased image. A mask is also created using the design database, and the mask is imaged to produce a mask image. The biased image is compared to the mask image, and a new value for the bias factor may be determined based on the comparison.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.