Rick Lai
3Patents
3h-index
8Co-inventors
33Inventor score
Filing activity: Dec 31, 2009 → Dec 22, 2010
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8592102B2 | Cost-effective method for extreme ultraviolet (EUV) mask production | Physics | 8 | Active |
| US9671685B2 | Lithographic plane check for mask processing | Physics | 4 | Active |
| US8818072B2 | Rendered database image-to-inspection image optimization for inspection | Physics | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.