Patent · US Active

Wafer unloading system and wafer processing equipment including the same

US8821219B2 · kind B2 · utility

1Cited by
4References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 18, 2011
Grant dateSep 2, 2014
Priority date
Expiry dateMar 25, 2033

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24B37/345
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A wafer unloading system and wafer processing equipment (system) including the same are disclosed. The wafer unloading system includes a fluid supply tube for supplying a fluid, a nozzle for injecting the supplied fluid, and an injection hole defined in a plate to allow the injected fluid to reach a space between a polishing pad and a wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.