Method for preparing samples for imaging
US8822921B2 · kind B2 · utility
8Cited by
2References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 31, 2013 |
| Grant date | Sep 2, 2014 |
| Priority date | — |
| Expiry date | Dec 31, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31745
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.