Optical thin-film vapor deposition apparatus and optical thin-film production method
US8826856B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2009 |
| Grant date | Sep 9, 2014 |
| Priority date | — |
| Expiry date | Aug 17, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3132
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An optical thin-film vapor deposition apparatus and method are capable of producing an optical thin-film by vapor depositing a vapor deposition substance onto substrates (14) within a vacuum vessel (10). A dome shaped holder (12) is disposed within the vacuum vessel (10) and holds the substrates (14). A drive rotates the dome shaped holder (12). A vapor depositing source (34) is disposed oppositely to the substrates (14). An ion source (38) irradiates ions to the substrates (14). A neutralizer (40) irradiates electrons to the substrates (14). The ion source (38) is disposed at an angle between an axis, along which ions are irradiated from the ion source (38), and a line perpendicular to a surface of each of the substrates (14). The angle is between 8° inclusive and 40° inclusive. A ratio of a distance in a vertical direction between (i) a center of rotational axis of the dome shaped holder (12), and (ii) a center of the ion source (38), relative to a diameter of the dome shaped holder (12), is between 0.5 inclusive and 1.2 inclusive.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.